CALL FOR PAPERS

INTL EMAIL BULLETIN OF PHOTOEXCITED PROCESSES & APPLICATIONS PHOTOEXE%ILCTEHOL at VMS.HUJI.AC.IL
Sun Dec 5 04:36:16 EST 1993



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                                 EMAIL MESSAGE 05-12-93
...............................................................................


                                 E-MRS 1994 SPRING MEETING

                                       to be held at

                           Council of Europe/European Parliament
                                     Strasbourg, France

                                      May 24-27, 1994
>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>>

                                    CONFERENCE PROGRAMME

             SYMPOSIUM B  PHOTON-ASSISTED PROCESSING OF SURFACES AND THIN FILMS

             SYMPOSIUM C  Photorefractive Materials: Growth and Doping, Optical
                          and Electrical Characteristics, Charge Transfer
                          Processes and Space Charge Field Effects,
                          Applications.

             SYMPOSIUM D  Organic Materials for Electronics: Polymer Interfaces
                          with Metals and Semiconductors

             SYMPOSIUM E  High Temperature Electronics: Materials, Devices and
                          Applications

             SYMPOSIUM F  Porous Silicon and Related Materials

             SYMPOSIUM G  First European Material Research Society Workshop on
                          Advanced Materials Education

             SYMPOSIUM H  New Materials for the Conservation of Cultural
                          Heritage

...............................................................................

          SYMPOSIUM B: Photon-Assisted Processing of Surfaces and Thin Films

             The steadily improving performance of existing lasers and lamps
             and the development of new photon sources greatly stimulates
             research into their possible use in an ever broadening range of
             applications.  This symposium covers all aspects of the effects of
             photons from these sources on etching, deposition, doping,
             modification and patterning of surfaces and thin films.  Investi-
             gations of the basic mechanisms, kinetics and modelling of the
             physical and chemical processes involved, as well as studies of
             the applications and the characterization of the products are
             included.  Specific topics comprise:

                Pulsed laser ablation of materials, both for patterning
                purposes as well as for the deposition of single and multi-
                layer thin films of semiconductors, photoconductors,
                dielectrics, metals, etc.

                Laser, or lamp-assisted chemical vapour deposition of con-
                tinuous and patterned thin films, atomic layer epitaxy.

                Focused laser beam-induced desorption, ablation, deposition or
                modification of thin films for marking, recording and mask
                production or repair.

                Resistless projection patterning of thin films, selective area
                doping and deposition.

                Continuous or patterned modification of surface films for the
                production of metallisation, wear resistance, isolation,
                adherence, seeding, etc.

                Laser, or lamp-anealing of thin films.

                In-situ process and thin film diagnostics.

              Scientific Committee:

             C. Afonso, CSIC, Inst. Optica, Spain
             P. Baeri, University of Catania, Italy.
             J.O. Carlsson, Uppsala University, Sweden.
             J.M.D. Coey, Trinity College, Dublin, Ireland.
             J.J. Dubowski, National Research Council, Canada.
             P. Dyer, University of Hull, UK.
             J.G. Eden, Univ. Illinois Urbana-Champaign, USA.
             M. Hanabusa, Toyohashi Univ. Technology, Japan.
             E.W. Kreutz, RWTH Aachen, Germany.
             R. Larciprete, ENEA, INN/FIS, Italy.
             L. Laude, University de Mons, Hainaut, Belgium.
             S. Lepavuori, University of Oulu, Finland.
             W. Marine, Facultedes Sciences de Luminy, France.
             S.B. Ogale, University of Poona, India.
             A. Peled, CTEH, aff. Tel-Aviv University, Israel.
             J. Perrier, University Paris VI et VII, France.
             T. Szorenyi, Hungarian Academy Sciences, Hungary.


                            Chairpersons:

             Dr. U.K.P. Biermann            Prof. P. Hess
             Philips Research Labs          Phys. Chem. Inst.
             Bldg. WZ, P.O. Box 80000       Ruprecht-Karls-Universitat
             5600JA Eindohoven              Im Neuenheimer Feld 253
             The Netherlands.               69120 Heidelberg, Germany.
             Tel: (+31)40 74 2430           Tel:   (+49) 6221 565205
             Fax: (+31)40 74 2081           Fax:   (+49) 6221 563199
                                            EMail: B95 at VM.URZ.UNI-HEIDELBERG.DE

             Dr. J. Dieleman
             DSA Consultants
             Geranium laan 11
             5582 GD Waalre
             The Netherlands
             Tel: (+31) 49 04 13682
             Fax: (+31) 40 74 2081

      FOR PREREGISTRATION FORMS AND ABSTRACT SUBMISSION PLEASE CONTACT
      ONE OF THE CHAIRPERSONS ABOVE.

             Papers are solicited in the areas described earlier. Abstracts
             (confined to an area of 17.5 cm wide by 23 cm long) should be
             submitted to one of the chairpersons. Papers will be selected by
             the scientific committee of each symposium.

                      DEADLINE FOR ABSTRACT SUBMISSION: MARCH 10, 1994


             Authors will be notified of acceptance and mode of presentation of
             their papers by April 10, 1994.

             PROCEEDINGS

             Full length papers will be published in a Proceedings Volume by
             ELSEVIER/NORTH HOLLAND. Submitted papers will be refereed.
             Instructions to Authors will be dispatched together with the
             notification of acceptance of the abstract.

             All articles should be submitted on or before the first day of the
             conference!

             CONFERENCE SECRETARIAT

             P. SIFFERT, E-MRS 1994 SPRING MEETING, BP 20, 67037 Strasbourg
             Cedex 2, France.
             Phone: (33)88 10 65 43 - Fax: (33)88 10 62 93
             EMail: UNAMUNO at FRCPN11

             CONFERENCE LANGUAGE IS ENGLISH.
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EMAIL MESSAGE COMMUNICATED BY :PROF. PETER HESS <B95 at VM.UNI-HEIDELBERG.DE>



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